Estimating the intensity of germ-grain models with overlapping grains

AuthorsH. Ghorbani, D. Stoyan
JournalImage Analysis & Stereology
Presented byFreiberg
Page number147-152
Serial number3
Volume number22
IF1.615
Paper TypeFull Paper
Published At2003
Journal GradeScientific - research
Journal TypeTypographic
Journal CountryIran, Islamic Republic Of
Journal IndexScopus

Abstract

Formulas are derived for the spherical contact distribution of a planar germ-grain model Z with circular grains where the germs formeither a 'segment cluster' process or a 'line-based' Poisson point process. They are used in order to estimate the intensityl of the germprocess by means of the spherical contact distribution function. As an application the number of dislocations on a silicon wafer is estimated.

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tags: dislocations; germ-grain model; intensity; Poison cluster process; Poison line process; silicon wafer; spherical contact distribution function