Establishing a Correction Factor for Oblique Angle Deposition and Its Verification by the Magneto-Optical Kerr Effect

Abstract

Physical vapor deposition (PVD) is one of the major methods for fabricating thin films. Measuring and controlling the thickness of deposited layers are very momentous, especially for optics and photonics applications. Despite regular depositions with substrates situated near the thickness monitor, the oblique angle deposition method requires applying a correction factor for estimating real thicknesses. In this paper, we establish a correction factor formula for different positions of the substrate relative to the deposition source. After numerical simulations, several samples with [Glass/Nickel] and [Glass/Nickel/Zinc Sulfide] structures are fabricated using an oblique angle PVD method. Magneto-optical Kerr measurements and hysteresis loop analysis are obtained from three different points of samples with different thicknesses and compared to the corresponding simulated structures. The results of the correction factor show a high degree of conformity with simulations. Cross-sectional field emission scanning electron microscopic characterization is also used to illustrate the thickness of samples. The thicknesses are then compared to the results obtained from the correction factor, confirming its reliability for practical use in oblique angle deposition methods.