| Authors | S.A.R. Firoozifar , A. Behjata,, E. Kadivarc, S.M.B. Ghorashia, M. Borhani Zarandia |
|---|---|
| Journal | Applied Surface Science |
| Page number | ۸۱۸– ۸۲۱ |
| Paper Type | Full Paper |
| Published At | ۳ September ۲۰۱۱ |
| Journal Grade | ISI |
| Journal Type | Typographic |
| Journal Country | Iran, Islamic Republic Of |
Abstract
To conduct this study, zinc sulfide (ZnS) thin films deposited on germanium (Ge) substrates were prepared
by an evaporation method. The effects of deposition rate and annealing on the optical properties and
adhesion of the ZnS thin films were investigated. The transmission intensity and the X-ray diffraction
(XRD) pattern of the samples showed that the transmittance of the samples decreases by increasing the
evaporation rates. However, with the increase of the annealing temperature, crystallinity of the thin films
improves which, in turn, results in the enhancement of the transmission intensity in a far infrared region.
The maximum grain size was obtained at the annealing temperature of 225 ◦C. Our experimental results
also show that evaporation rate and annealing influences the adhesion of ZnS thin films to Ge substrates.
tags: Annealing Optical properties ZnS Antireflection Adhesion Ge