Self-Ordered Nanopore Arrays with 300–400nm Interpore Distances Formed by High Field Accelerated Mild Anodization

Abstract

High field accelerated mild anodization was used to fabricate self-ordered nanoporous alumina arrays. The phosphoric acid with various concentrations was used in a wide range of anodization voltages. Two different temperatures for both sides of the samples were employed to maintain a mid level of current density during the anodization process. The interpore distances were seen to vary from 300 to 400nm when the anodization voltages changed from 150 to 190 V. A nonlinear-inverse relation between electrolyte concentrations of phosphoric acid and anodization voltages was found in the optimum self-ordering conditions. Similar to the hard anodization, the ratio of interpore distance to voltage was 2 nm/V in high field accelerated mild anodization technique.