Estimating the intensity of germ-grain models with overlapping grains

نویسندگانH. Ghorbani, D. Stoyan
نشریهImage Analysis & Stereology
ارائه به نام دانشگاهFreiberg
شماره صفحات147-152
شماره سریال3
شماره مجلد22
ضریب تاثیر (IF)1.615
نوع مقالهFull Paper
تاریخ انتشار2003
رتبه نشریهعلمی - پژوهشی
نوع نشریهچاپی
کشور محل چاپایران
نمایه نشریهScopus

چکیده مقاله

Formulas are derived for the spherical contact distribution of a planar germ-grain model Z with circular grains where the germs formeither a 'segment cluster' process or a 'line-based' Poisson point process. They are used in order to estimate the intensityl of the germprocess by means of the spherical contact distribution function. As an application the number of dislocations on a silicon wafer is estimated.

لینک ثابت مقاله

tags: dislocations; germ-grain model; intensity; Poison cluster process; Poison line process; silicon wafer; spherical contact distribution function